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MG POSITIVE PHOTORESIST DEVELOPER 418-500ML
PID# 488
CA$18.95 EACH
6 In Stock
Description
For removing exposed resist during the positive photofabrication process.
- Disolves exposed photoresist
- Concentrated formulation - dilute one part developer to ten parts water
- For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
- Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .
| Catalog Number | Sizes Available | Description |
|---|---|---|
| 418-500ML | 500 mL (17 fl. oz) | Liquid |
Frequently bought together
